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Fundamental of Electroless Process

The electroless process is a unique method of depositing metallic films onto various substrates without the need for an external electrical power source. This presentation provides an overview of the fundamental principles of the electroless process, including the components involved and the experimental methodology. The different types of reducing agents used in the process and their impact on the deposition rate and properties of the deposited films are discussed in detail. The presentation explores the mechanism of the reactions that occur at the electrode surface during the electroless process when different reducing agents are used. The use of Pourbaix diagrams and mixed potential charts to analyze the electroless process is also covered. The presentation highlights the importance of the mixed-potential theory, Wagner-Traud and Evan’s diagrams, and how they are used to predict the behavior of the electroless process under different conditions. The presentation also provides an in-depth analysis of the structure and properties of the deposited films, including their morphology, composition, and mechanical properties. The use of annealing and self-annealing processes to improve the properties of the deposited films is also discussed. Different experimental techniques, including SEM and EDS, are used to characterize the deposited films, and the results of these experiments are presented in the presentation. Overall, this presentation provides valuable insights into the electroless process and its applications in various industries.